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Mit Hilfe einer Hochfrequenzplasmaentladung 13. Während der Messung zeigte die Oberflächennormale auf den Eintrittsschlitz des Halbkugelanalysators. These structures provide elastic, electrostatic, and osmotic resistance to compression and form an interface that can easily be sheared.

However, the disclosed therein coatings have a higher carbon content than the produced by the inventive method coatings with at least 25 at% and not have the above-mentioned combination of favorable properties. Dieser Effekt wird im Fall von Unregelmäßigkeiten wie etwa bei mechanischer Beschädigung oder mangelnder Haftung der Dickschichten noch verstärkt. The method according to one of the preceding claims, wherein in step B oxygen is supplied to the plasma and preferably all of the substances supplied to the plasma in step B are gaseous before entering the plasma polymerisation reactor and the ratio of the gas flows of oxygen and further precursor s supplied to the plasma in step B is in the range of 1:1 to 6:1, preferably 3:1 to 5. So konnte in eigenen Versuchen etwa festgestellt werden, dass sich auf einem runden Substrat mit einem Durchmesser von 10 cm die maximale Schichtdicke von der minimalen Schichtdicke bei 100 V Self-Bias um den Faktor 1,1 unterscheiden kann, während dieser Faktor bei 200 V Self-Bias 1.

Family - In addition, the internal stresses are increased in the interface region between the coating and substrate. The yellow index can be adjusted to 4 without losing the anti-corrosion effect.

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Vorzugsweise unterscheidet sich in einem erfindungsgemäßen beschichteten Metallsubstrat die maximale Schichtdicke von der minimalen Schichtdicke um den Faktor 1,1 oder geringer. Zudem können an der Beschichtungsoberfläche schmutzabweisende niederenergetische Oberflächeneigenschaften eingestellt werden. Die erzielbare Schichteigenschaftsfunktion ist nicht nur als Chromatierungsersatz von Interesse, sondern auch für die generelle Beschichtung von Nicht-Leichtmetallen. Wie bereits ausgeführt, können die Korrosionsschutzeigenschaften der Beschichtung durch z. Method according to one of the preceding claims, wherein step B is deposited to a thickness of the deposited layer of greater than or equal to 2 microns, preferably greater than or equal to 4 micron performed.